Icephobic Coating through a Self-Formed Superhydrophobic Surface Using a Polymer and Microsized Particles, ACS Applied Materials & Interfaces
, 제14권(집)
, 제2호
, PP.3334~3343
, 2022.01.04
Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O-3 reactants, DALTON TRANSACTIONS
, 제50권(집)
, 제48호
, PP.17935~17944
, 2021.12.14
Evaluation of Silicon Tetrahalide Precursors for Low-temperature Thermal Atomic Layer Deposition of Silicon Nitride, APPLIED SURFACE SCIENCE
, 제565권(집)
, 2021.11.01
Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition, Nanomaterials
, 제11권(집)
, 제7호
, 2021.07.09
Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches, CHEMISTRY OF MATERIALS
, 제33권(집)
, 제12호
, PP.4435~4444
, 2021.06.22
Self-Formation of Superhydrophobic Surfaces through Interfacial Energy Engineering between Liquids and Particles, LANGMUIR
, 제37권(집)
, 제17호
, PP.5356~5363
, 2021.04.23
Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor, CHEMISTRY OF MATERIALS
, 제32권(집)
, 제20호
, PP.8921~8929
, 2020.10.27
Promoting lithium electrodeposition towards the bottom of 3-D copper meshes in lithium-based batteries, JOURNAL OF POWER SOURCES
, 제472권(집)
, 2020.10.01
Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells, APPLIED SURFACE SCIENCE
, 제519권(집)
, 2020.07.30
Preparation of a Hydrophobic Cerium Oxide Nanoparticle Coating via a Facile Solution Route, CERAMICS INTERNATIONAL
, 제46권(집)
, 제8호
, PP.12209~12215
, 2020.06.01
Selective Toolbox for Nanofabrication, CHEMISTRY OF MATERIALS
, 제32권(집)
, 제8호
, PP.3323~3324
, 2020.04.14
Tunable Color Coating of E‐Textiles by Atomic Layer Deposition of Multilayer TiO2/Al2O3 Films, LANGMUIR
, 제36권(집)
, 제11호
, PP.2794~2801
, 2020.03.24
Effect of molecular backbone structure on vapor phase coupling reaction between diiso(thio)cyanates with diamines, diols, and dithiols , PROGRESS IN ORGANIC COATINGS
, 제140권(집)
, 2020.03.01
Surface Energy Change of Atomic-scale Metal Oxide Thin Films by Phase Transformation, ACS Nano
, 제14권(집)
, 제1호
, PP.676~687
, 2020.01.13
Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces, CHEMISTRY OF MATERIALS
, 제31권(집)
, 제21호
, PP.8995~9002
, 2019.11.12
Moisture Barrier Properties of Low-temperature Atomic Layer Deposited Al2O3 using Various Oxidants, CERAMICS INTERNATIONAL
, 제45권(집)
, 제15호
, PP.19105~19112
, 2019.10.15
Science against Pseudoscience, CHEMISTRY OF MATERIALS
, 제31권(집)
, 제18호
, PP.7113~7115
, 2019.09.24
Thermal Atomic Layer Deposition of Metallic Ru using H2O as a Reactant, APPLIED SURFACE SCIENCE
, 제488권(집)
, PP.896~902
, 2019.09.15
Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers, ACS Applied Materials & Interfaces
, 제11권(집)
, 제18호
, PP.16804~16814
, 2019.05.08
Molecular oxidation of surface -CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O-3 : A theoretical study, APPLIED SURFACE SCIENCE
, 제457권(집)
, PP.376~380
, 2018.11.01
Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors, CHEMISTRY OF MATERIALS
, 2018.10.11
Comparative Study of the Growth Characteristics and Electrical Properties of Atomic-Layer-Deposited HfO2 Films obtained from Metal Halide and Amide Precursors, Journal of Materials Chemistry C
, 제6권(집)
, 제27호
, PP.7367~7376
, 2018.06.29
Interlayer-assisted atomic layer deposition of MgO as a magnetic tunneling junction insulators , JOURNAL OF ALLOYS AND COMPOUNDS
, 제747권(집)
, PP.505~510
, 2018.05.30
Effect of h-BN coating on nucleate boiling heat transfer performance in pool boiling, EXPERIMENTAL THERMAL AND FLUID SCIENCE
, 2018.05.15
Amorphous TiO2/p-Si Heterojunction Photodiode prepared by Low-temperature Atomic Layer Deposition, Nanoscience and Nanotechnology Letters
, 2018.05.01
Circular Double-Patterning Lithography using a Block Copolymer Template and Atomic Layer Deposition, Advanced Materials Interfaces
, 제5권(집)
, 제16호
, 2018.04.20
Cobalt Titanium Nitride Amorphous Metal Alloys by Atomic Layer Deposition, JOURNAL OF ALLOYS AND COMPOUNDS
, 제737권(집)
, PP.684~692
, 2018.03.15
assisted atomic layer deposition of MgO as a magnetic tunneling junction insulators, JOURNAL OF ALLOYS AND COMPOUNDS
, 제747권(집)
, PP.505~510
, 2018.03.07
Effect of Porous Graphene Networks and Micropillar Arrays on Boiling Heat Transfer Performance, EXPERIMENTAL THERMAL AND FLUID SCIENCE
, 제93권(집)
, PP.153~164
, 2018.03.05
Copper indium selenide water splitting photoanodes with artificially designed heterophasic blended structure and their high photoelectrochemical performances, Nano Energy
, 제46권(집)
, PP.1~10
, 2018.01.17
Water-Erasable Memory Device for Security Applications Prepared by the Atomic Layer Deposition of GeO2, CHEMISTRY OF MATERIALS
, 제30권(집)
, 제3호
, PP.830~840
, 2018.01.12
Conduction Mechanism Change with Transport Oxide Layer Thickness in Oxide Hetero-interface Diode, APPLIED PHYSICS LETTERS
, 제111권(집)
, 제5호
, 2017.08.02
Dual Role of Sb-incorporated Buffer Layers for High Efficiency Cuprous Oxide Photocathodic Performance: Remarkably Enhanced Crystallinity and Effective Hole Transport, ACS Sustainable Chemistry & Engineering
, 제5권(집)
, 제9호
, PP.8213~8221
, 2017.07.17
Atomic layer deposition of Y-stabilized ZrO2 for advanced DRAM capacitors, JOURNAL OF ALLOYS AND COMPOUNDS
, 제722호
, PP.307~312
, 2017.06.08
Atomic Layer Deposition on 2D Materials, CHEMISTRY OF MATERIALS
, 제29권(집)
, 제9호
, PP.3809~3826
, 2017.04.25
Vapor Phase Synthesis of TaS2 Nanocrystals with Iodine as Transport Agent, JAPANESE JOURNAL OF APPLIED PHYSICS
, 제56권(집)
, PP.45501~
, 2017.03.03
Distribution of oxygen functional groups of graphene oxide obtained from low-temperature atomic layer deposition of titanium oxide, RSC Advances
, 제7권(집)
, 제23호
, PP.13979~13984
, 2017.03.02
Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant, CURRENT APPLIED PHYSICS
, 제17권(집)
, 제3호
, PP.333~338
, 2017.03.01
A Composite Layer of Atomic-Layer-Deposited Al2O3 and Graphene for Flexible Moisture Barrier, CARBON
, 제116권(집)
, PP.553~561
, 2017.02.17
Atomic Layer Deposition of 1D and 2D Nickel Nanostructures on Graphite, NANOTECHNOLOGY
, 제28권(집)
, 제11호
, PP.115301~
, 2017.02.13
Uniform color coating of multilayered TiO2/Al2O3 films by atomic layer deposition, Journal of Coatings Technology and Research
, 2017.01.01
Very High Frequency Plasma Reactant for Atomic Layer Deposition, APPLIED SURFACE SCIENCE
, 제387권(집)
, PP.109~117
, 2016.11.30
Highly Conductive and Flexible Fiber for Textile Electronics Obtained by Extremely Low Temperature Atomic Layer Deposition of Pt, NPG Asia Materials
, 2016.11.25
Fabrication of 50-nm Scale Nanostructures by Block Copolymer and Its Characteristics of Surface-enhanced Raman Scattering, RSC Advances
, 제6권(집)
, 제75호
, PP.70756~70762
, 2016.07.26
High Efficiency n-Si/p-Cu2O Core?shell Nanowires Photodiode Prepared by Atomic Layer Deposition of Cu2O on Well-ordered Si Nanowires Array, Electronic Materials Letters
, 제12권(집)
, 제3호
, PP.404~410
, 2016.05.10
A Facile Method for Selective Healing of Graphene Defects Based on a Galvanic Displacement Reaction, NPG Asia Materials
, 제8권(집)
, 2016.04.15
Recent Advances in Atomic Layer Deposition, CHEMISTRY OF MATERIALS
, 제28권(집)
, 제7호
, PP.1943~1947
, 2016.04.12
Formation of Ni Silicide from Atomic Layer Deposited Ni, CURRENT APPLIED PHYSICS
, 제16권(집)
, 제7호
, PP.720~725
, 2016.04.06
Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu, Journal of Alloys and Compounds
, 제663권(집)
, PP.651~658
, 2016.04.01
Comparison of Hydrogen Sulfide Gas and Sulfur Powder for Synthesis of Molybdenum Disulfide Nanosheets, CURRENT APPLIED PHYSICS
, 제16권(집)
, 제7호
, PP.691~695
, 2016.04.01
Effects of TaN Diffusion Barrier on Cu-gate ZnO:N Thin Film Transistors, IEEE ELECTRON DEVICE LETTERS
, 제37권(집)
, 제5호
, PP.599~602
, 2016.03.31
Effects of Cl-based Ligand Structures on Atomic Layer Deposited HfO2, Journal of Physical Chemistry C
, 제120권(집)
, 제11호
, PP.5958~5967
, 2016.03.11
Plasma-enhanced atomiclayerdepositionofSnO2 thin films usingSnCl4 and O2 plasma, MATERIALS LETTERS
, 제166권(집)
, PP.163~166
, 2016.03.01
Growth Characteristics and Electrical Properties of SiO2 Thin Films Prepared using Plasma-Enhanced Atomic Layer Deposition and Chemical Vapor Deposition with an Aminosilane Precursor, JOURNAL OF MATERIALS SCIENCE
, 제51권(집)
, 제11호
, PP.5082~5091
, 2016.02.22
A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition, MATERIALS LETTERS
, 제168권(집)
, PP.218~222
, 2016.01.17
Wafer-scale, conformal and direct growth of MoS2 thin filmsby atomic layer deposition, APPLIED SURFACE SCIENCE
, 제365권(집)
, PP.160~165
, 2016.01.08
Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides, Scientific Reports
, 2016.01.04
Improved Corrosion Resistance and Mechanical Properties of CrN Hard Coatings with Atomic Layer Deposited Al2O3 Inter layer, ACS Applied Materials & Interfaces
, 제7권(집)
, 제48호
, PP.26716~26725
, 2015.11.23
Area-Selective Chemical Vapor Deposition of Co for Cu Capping Layer, CURRENT APPLIED PHYSICS
, 2015.10.30
Formation of Continuous Pt Films on the Graphite Surface by Atomic Layer Deposition with Reactive O3, CHEMISTRY OF MATERIALS
, 2015.10.01
Nucleation and Growth of an HfO2 Dielectric Layer for Graphene-Based Devices, CHEMISTRY OF MATERIALS
, 제27권(집)
, 제17호
, PP.5868~5877
, 2015.08.19
Reversible Liquid Adhesion Switching of Superamphiphobic Pd-decorated Ag dendrites via Gas-induced Structural Changes, CHEMISTRY OF MATERIALS
, 제27권(집)
, 제14호
, PP.4964~4971
, 2015.06.30
이산화 티타늄 위에서의 원자층 증착법 백금의 성장 특성, 한국표면공학회지
, 제48권(집)
, 제2호
, PP.38~42
, 2015.04.30
Growth of Atomic Layer Deposition Platinum on TiO2, 한국표면공학회지
, 제48권(집)
, 제2호
, PP.38~42
, 2015.04.30
In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides, Journal of Materials Chemistry C
, 제3권(집)
, PP.4852~4858
, 2015.04.22
Internal and External Atomic Steps in Graphite Exhibit Dramatically Different Physical and Chemical Properties, ACS Nano
, 제9권(집)
, PP.3814~3819
, 2015.03.27
Contact resistance reduction using Fermi level de-pinning layer for MoS2 FETs, International Electron Devices Meeting (IEDM)
, 2015.03.02
One-step hydrothermal synthesis of graphene decorated V2O5 nanobelts for enhanced electrochemical energy storage, Scientific Reports
, 제5권(집)
, 2015.01.30
Real-time Detection of Chlorine Gas using Ni/Si Shell/Core Nanowires, Nanoscale Research Letters
, 제10권(집)
, 제1호
, PP.1~18
, 2015.01.28
Plasma-enhanced atomic layer deposition of Co on metal surfaces, SURFACE & COATINGS TECHNOLOGY
, 제264권(집)
, PP.60~65
, 2015.01.16
Hydrophobic Property of Rare Earth Oxides by Atomic Layer Deposition, CHEMISTRY OF MATERIALS
, 2014.12.19
Selective metal deposition at graphene line defects by atomic layer deposition, NATURE COMMUNICATIONS
, 제5권(집)
, PP.4781~4789
, 2014.09.02
Effect of O3 on Growth of Pt by Atomic Layer Deposition, Journal of Physical Chemistry C
, 제118권(집)
, 제23호
, PP.12325~12332
, 2014.06.02
Vapor transport deposition and epitaxy of orthorhombic SnS on glass and NaCl substrates, APPLIED PHYSICS LETTERS
, 제103권(집)
, 제5호
, PP.1~5
, 2013.07.30
Self-Assembly Based Plasmonic Arrays Tuned by Atomic Layer Deposition for Extreme Visible Light Absorption, NANO LETTERS
, 제13권(집)
, 제7호
, PP.3352~3357
, 2013.07.01
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)(2) precursor, JOURNAL OF ENERGY CHEMISTRY
, 제22권(집)
, 제3호
, PP.403~407
, 2013.05.01
Growth of Pt Nanowires by Atomic Layer Deposition on Highly Ordered Pyrolytic Graphite, NANO LETTERS
, 제13권(집)
, PP.457~463
, 2013.02.14
Flexible Wireless Temperature Sensors Based on Ni Microparticle-Filled Binary Polymer Composites, ADVANCED MATERIALS
, 제25권(집)
, 제6호
, PP.850~855
, 2013.02.13
Ru nanodot synthesis using CO2 supercritical fluid deposition, JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS
, 제74권(집)
, 제5호
, PP.664~667
, 2013.01.05
Supercritical Fluid Deposition of SiO2 Thin Films: Growth Characteristics and Film Properties, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제159권(집)
, 제2호
, PP.46~49
, 2012.12.15
Nucleation-Controlled Growth of Nanoparticles by Atomic Layer Deposition, CHEMISTRY OF MATERIALS
, 제24권(집)
, 제21호
, PP.4051~4059
, 2012.10.19
The Low Temperature Atomic Layer Deposition of Ruthenium and the Effect ofOxygen Exposure, JOURNAL OF MATERIALS CHEMISTRY
, 제22권(집)
, PP.25154~25160
, 2012.10.01
Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for the OxygenEvolution and Oxygen Reduction Reactions, Advanced Energy Materials
, 제2권(집)
, 제10호
, PP.1269~1277
, 2012.06.14
Silicide Formation of Atomic Layer Deposition Co Using Ti and Ru Capping Layer, 한국재료학회지
, 제22권(집)
, 제4호
, PP.202~206
, 2012.04.01
Initial Stage Growth during Plasma Enhanced Atomic Layer Deposition of Cobalt, CHEMICAL VAPOR DEPOSITION
, 제18권(집)
, PP.41~45
, 2012.03.05
Silicidation of Co/Si Core Shell Nanowires, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제159권(집)
, 제5호
, PP.146~151
, 2012.03.02
Microstructure-Dependent Nucleation in Atomic Layer Deposition of Pt on TiO2, CHEMISTRY OF MATERIALS
, 제24권(집)
, 제2호
, PP.279~286
, 2012.01.24
Atomic Layer Deposition of CdS Quantum Dots for Solid-State Quantum Dot Sensitized Solar Cells, ADVANCED ENERGY MATERIALS
, 제1권(집)
, 제6호
, PP.1169~1175
, 2011.11.01
In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
, 제11권(집)
, 제2호
, PP.1577~1580
, 2011.02.01
Effects of Self-Assembled Monolayers on Solid-State CdS Quantum Dot Sensitized Solar Cells, ACS NANO
, 제5권(집)
, 제2호
, PP.1495~1504
, 2011.02.01
Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제158권(집)
, 제11호
, PP.1179~1182
, 2011.01.01
Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제158권(집)
, 제1호
, PP.1~5
, 2011.01.01
Deposition of Ultrathin Polythiourea Films by Molecular Layer Deposition, CHEMISTRY OF MATERIALS
, 제22권(집)
, 제19호
, PP.5563~5569
, 2010.10.01
Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition, JOURNAL OF CRYSTAL GROWTH
, 제312권(집)
, 제15호
, PP.2215~2219
, 2010.07.01
Plasma-Enhanced Atomic Layer Deposition of Ni, JAPANESE JOURNAL OF APPLIED PHYSICS
, 제49권(집)
, 2010.05.01
Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor, JAPANESE JOURNAL OF APPLIED PHYSICS
, 제49권(집)
, 2010.05.01
Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제157권(집)
, 제12호
, PP.600~604
, 2010.01.01
High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant, JOURNAL OF THE ELECTROCHEMICAL SOCIETY
, 제157권(집)
, PP.D10~D15
, 2010.01.01
Degradation of the Deposition Blocking Layer During Area-Selective Plasma-Enhanced Atomic Layer Deposition of Cobalt, JOURNAL OF THE KOREAN PHYSICAL SOCIETY
, 제56권(집)
, PP.104~107
, 2010.01.01
<저서>
Atomic Layer Deposition for Semiconductors, Ch.8 Back End of the Line, Springer US
, 2013.10.29
Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH
, 2011.12.01