Organosulfide Inhibitor Instigated Passivation of Multiple Substrates for Area-Selective Atomic Layer Deposition of HfO2, CHEMISTRY OF MATERIALS , 제36권(집) , 제6호 , PP.2661~2673 , 2024.02.22

Atomic Layer Deposition Beyond Thin Film Deposition Technology, Advanced Materials Technologies , 제8권(집) , 제20호 , 2023.10.01

Self-formation of a Ru/ZnO Multifunctional Bilayer through Area-Selective Atomic Layer Deposition for Interconnect Technology, Small , 제19권(집) , 제34호 , 2023.08.01

Area-Selective Deposition of Ruthenium Using Homometallic Precursor Inhibitor, CHEMISTRY OF MATERIALS , 제35권(집) , 제14호 , PP.5331~5340 , 2023.07.03

Borderless Collaboration in Materials Chemistry for an Industrial Ecosystem in the Semiconductor Industry, CHEMISTRY OF MATERIALS , 제35권(집) , 제11호 , PP.4117~4119 , 2023.06.13

Expanding Atomic Layer Deposition from Silicon Substrates to Coke Bottles: An Interview with Steven M. George for Chemistry of Materials' 1k Club, CHEMISTRY OF MATERIALS , 제35권(집) , 제9호 , PP.3343~3344 , 2023.05.09

Dysprosium Incorporation for Phase Stabilization of Atomic-Layer-Deposited HfO2 Thin Films, CHEMISTRY OF MATERIALS , 제35권(집) , 제6호 , PP.2312~2320 , 2023.03.28

Gradient area-selective deposition for seamless gap-filling in 3D nanostructures through surface chemical reactivity control, Nature Communications , 제13권(집) , 제1호 , 2022.12.09

Computational Modeling of Physical Surface Reactions of Precursors in Atomic Layer Deposition by Monte Carlo Simulations on a Home Desktop Computer, CHEMISTRY OF MATERIALS , 제34권(집) , 제17호 , PP.7635~7649 , 2022.09.13

Elucidating the Reaction Mechanism of Atomic Layer Deposition of Al2O3 with a Series of Al(CH3)xCl3−x and Al(CyH2y+1)3 Precursors, Journal of the American Chemical Society , 제144권(집) , 제26호 , PP.11757~11766 , 2022.06.06

Icephobic Coating through a Self-Formed Superhydrophobic Surface Using a Polymer and Microsized Particles, ACS Applied Materials & Interfaces , 제14권(집) , 제2호 , PP.3334~3343 , 2022.01.04

Growth modulation of atomic layer deposition of HfO2 by combinations of H2O and O-3 reactants, DALTON TRANSACTIONS , 제50권(집) , 제48호 , PP.17935~17944 , 2021.12.14

Evaluation of Silicon Tetrahalide Precursors for Low-temperature Thermal Atomic Layer Deposition of Silicon Nitride, APPLIED SURFACE SCIENCE , 제565권(집) , 2021.11.01

Toward Enhanced Humidity Stability of Triboelectric Mechanical Sensors via Atomic Layer Deposition, Nanomaterials , 제11권(집) , 제7호 , 2021.07.09

Atomic Layer Modulation of Multicomponent Thin Films through Combination of Experimental and Theoretical Approaches, CHEMISTRY OF MATERIALS , 제33권(집) , 제12호 , PP.4435~4444 , 2021.06.22

Self-Formation of Superhydrophobic Surfaces through Interfacial Energy Engineering between Liquids and Particles, LANGMUIR , 제37권(집) , 제17호 , PP.5356~5363 , 2021.04.23

Effects of Al Precursors on Deposition Selectivity of Atomic Layer Deposition of Al2O3 using Ethanethiol Inhibitor, CHEMISTRY OF MATERIALS , 제32권(집) , 제20호 , PP.8921~8929 , 2020.10.27

Promoting lithium electrodeposition towards the bottom of 3-D copper meshes in lithium-based batteries, JOURNAL OF POWER SOURCES , 제472권(집) , 2020.10.01

Ultrathin effective TiN protective films prepared by plasma-enhanced atomic layer deposition for high performance metallic bipolar plates of polymer electrolyte membrane fuel cells, APPLIED SURFACE SCIENCE , 제519권(집) , 2020.07.30

Preparation of a Hydrophobic Cerium Oxide Nanoparticle Coating via a Facile Solution Route, CERAMICS INTERNATIONAL , 제46권(집) , 제8호 , PP.12209~12215 , 2020.06.01

Selective Toolbox for Nanofabrication, CHEMISTRY OF MATERIALS , 제32권(집) , 제8호 , PP.3323~3324 , 2020.04.14

Tunable Color Coating of E‐Textiles by Atomic Layer Deposition of Multilayer TiO2/Al2O3 Films, LANGMUIR , 제36권(집) , 제11호 , PP.2794~2801 , 2020.03.24

Effect of molecular backbone structure on vapor phase coupling reaction between diiso(thio)cyanates with diamines, diols, and dithiols , PROGRESS IN ORGANIC COATINGS , 제140권(집) , 2020.03.01

Surface Energy Change of Atomic-scale Metal Oxide Thin Films by Phase Transformation, ACS Nano , 제14권(집) , 제1호 , PP.676~687 , 2020.01.13

Reaction Mechanism of Pt Atomic Layer Deposition on Various Textile Surfaces, CHEMISTRY OF MATERIALS , 제31권(집) , 제21호 , PP.8995~9002 , 2019.11.12

Moisture Barrier Properties of Low-temperature Atomic Layer Deposited Al2O3 using Various Oxidants, CERAMICS INTERNATIONAL , 제45권(집) , 제15호 , PP.19105~19112 , 2019.10.15

Science against Pseudoscience, CHEMISTRY OF MATERIALS , 제31권(집) , 제18호 , PP.7113~7115 , 2019.09.24

Thermal Atomic Layer Deposition of Metallic Ru using H2O as a Reactant, APPLIED SURFACE SCIENCE , 제488권(집) , PP.896~902 , 2019.09.15

Analysis of Defect Recovery in Reduced Graphene Oxide and Its Application as a Heater for Self-Healing Polymers, ACS Applied Materials & Interfaces , 제11권(집) , 제18호 , PP.16804~16814 , 2019.05.08

Molecular oxidation of surface -CH3 during atomic layer deposition of Al2O3 with H2O, H2O2, and O-3 : A theoretical study, APPLIED SURFACE SCIENCE , 제457권(집) , PP.376~380 , 2018.11.01

Area-Selective Atomic Layer Deposition Using Si Precursors as Inhibitors, CHEMISTRY OF MATERIALS , 2018.10.11

Comparative Study of the Growth Characteristics and Electrical Properties of Atomic-Layer-Deposited HfO2 Films obtained from Metal Halide and Amide Precursors, Journal of Materials Chemistry C , 제6권(집) , 제27호 , PP.7367~7376 , 2018.06.29

Interlayer-assisted atomic layer deposition of MgO as a magnetic tunneling junction insulators , JOURNAL OF ALLOYS AND COMPOUNDS , 제747권(집) , PP.505~510 , 2018.05.30

Effect of h-BN coating on nucleate boiling heat transfer performance in pool boiling, EXPERIMENTAL THERMAL AND FLUID SCIENCE , 2018.05.15

Amorphous TiO2/p-Si Heterojunction Photodiode prepared by Low-temperature Atomic Layer Deposition, Nanoscience and Nanotechnology Letters , 2018.05.01

Circular Double-Patterning Lithography using a Block Copolymer Template and Atomic Layer Deposition, Advanced Materials Interfaces , 제5권(집) , 제16호 , 2018.04.20

Cobalt Titanium Nitride Amorphous Metal Alloys by Atomic Layer Deposition, JOURNAL OF ALLOYS AND COMPOUNDS , 제737권(집) , PP.684~692 , 2018.03.15

assisted atomic layer deposition of MgO as a magnetic tunneling junction insulators, JOURNAL OF ALLOYS AND COMPOUNDS , 제747권(집) , PP.505~510 , 2018.03.07

Effect of Porous Graphene Networks and Micropillar Arrays on Boiling Heat Transfer Performance, EXPERIMENTAL THERMAL AND FLUID SCIENCE , 제93권(집) , PP.153~164 , 2018.03.05

Copper indium selenide water splitting photoanodes with artificially designed heterophasic blended structure and their high photoelectrochemical performances, Nano Energy , 제46권(집) , PP.1~10 , 2018.01.17

Water-Erasable Memory Device for Security Applications Prepared by the Atomic Layer Deposition of GeO2, CHEMISTRY OF MATERIALS , 제30권(집) , 제3호 , PP.830~840 , 2018.01.12

Conduction Mechanism Change with Transport Oxide Layer Thickness in Oxide Hetero-interface Diode, APPLIED PHYSICS LETTERS , 제111권(집) , 제5호 , 2017.08.02

Dual Role of Sb-incorporated Buffer Layers for High Efficiency Cuprous Oxide Photocathodic Performance: Remarkably Enhanced Crystallinity and Effective Hole Transport, ACS Sustainable Chemistry & Engineering , 제5권(집) , 제9호 , PP.8213~8221 , 2017.07.17

Atomic layer deposition of Y-stabilized ZrO2 for advanced DRAM capacitors, JOURNAL OF ALLOYS AND COMPOUNDS , 제722호 , PP.307~312 , 2017.06.08

Atomic Layer Deposition on 2D Materials, CHEMISTRY OF MATERIALS , 제29권(집) , 제9호 , PP.3809~3826 , 2017.04.25

Nanoconfined Atomic Layer Deposition of TiO2/Pt Nanocavities: Towards Ultra-Small Highly Efficient Catalytic Nanorockets, ADVANCED FUNCTIONAL MATERIALS , 제27권(집) , 제24호 , 2017.04.24

Vapor Phase Synthesis of TaS2 Nanocrystals with Iodine as Transport Agent, JAPANESE JOURNAL OF APPLIED PHYSICS , 제56권(집) , PP.45501~ , 2017.03.03

Distribution of oxygen functional groups of graphene oxide obtained from low-temperature atomic layer deposition of titanium oxide, RSC Advances , 제7권(집) , 제23호 , PP.13979~13984 , 2017.03.02

Growth mechanism of Co thin films formed by plasma-enhanced atomic layer deposition using NH3 as plasma reactant, CURRENT APPLIED PHYSICS , 제17권(집) , 제3호 , PP.333~338 , 2017.03.01

A Composite Layer of Atomic-Layer-Deposited Al2O3 and Graphene for Flexible Moisture Barrier, CARBON , 제116권(집) , PP.553~561 , 2017.02.17

Atomic Layer Deposition of 1D and 2D Nickel Nanostructures on Graphite, NANOTECHNOLOGY , 제28권(집) , 제11호 , PP.115301~ , 2017.02.13

Uniform color coating of multilayered TiO2/Al2O3 films by atomic layer deposition, Journal of Coatings Technology and Research , 2017.01.01

Very High Frequency Plasma Reactant for Atomic Layer Deposition, APPLIED SURFACE SCIENCE , 제387권(집) , PP.109~117 , 2016.11.30

Highly Conductive and Flexible Fiber for Textile Electronics Obtained by Extremely Low Temperature Atomic Layer Deposition of Pt, NPG Asia Materials , 2016.11.25

Fabrication of 50-nm Scale Nanostructures by Block Copolymer and Its Characteristics of Surface-enhanced Raman Scattering, RSC Advances , 제6권(집) , 제75호 , PP.70756~70762 , 2016.07.26

High Efficiency n-Si/p-Cu2O Core?shell Nanowires Photodiode Prepared by Atomic Layer Deposition of Cu2O on Well-ordered Si Nanowires Array, Electronic Materials Letters , 제12권(집) , 제3호 , PP.404~410 , 2016.05.10

A Facile Method for Selective Healing of Graphene Defects Based on a Galvanic Displacement Reaction, NPG Asia Materials , 제8권(집) , 2016.04.15

Recent Advances in Atomic Layer Deposition, CHEMISTRY OF MATERIALS , 제28권(집) , 제7호 , PP.1943~1947 , 2016.04.12

Formation of Ni Silicide from Atomic Layer Deposited Ni, CURRENT APPLIED PHYSICS , 제16권(집) , 제7호 , PP.720~725 , 2016.04.06

Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu, Journal of Alloys and Compounds , 제663권(집) , PP.651~658 , 2016.04.01

Comparison of Hydrogen Sulfide Gas and Sulfur Powder for Synthesis of Molybdenum Disulfide Nanosheets, CURRENT APPLIED PHYSICS , 제16권(집) , 제7호 , PP.691~695 , 2016.04.01

Effects of TaN Diffusion Barrier on Cu-gate ZnO:N Thin Film Transistors, IEEE ELECTRON DEVICE LETTERS , 제37권(집) , 제5호 , PP.599~602 , 2016.03.31

Effects of Cl-based Ligand Structures on Atomic Layer Deposited HfO2, Journal of Physical Chemistry C , 제120권(집) , 제11호 , PP.5958~5967 , 2016.03.11

Plasma-enhanced atomiclayerdepositionofSnO2 thin films usingSnCl4 and O2 plasma, MATERIALS LETTERS , 제166권(집) , PP.163~166 , 2016.03.01

Growth Characteristics and Electrical Properties of SiO2 Thin Films Prepared using Plasma-Enhanced Atomic Layer Deposition and Chemical Vapor Deposition with an Aminosilane Precursor, JOURNAL OF MATERIALS SCIENCE , 제51권(집) , 제11호 , PP.5082~5091 , 2016.02.22

A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition, MATERIALS LETTERS , 제168권(집) , PP.218~222 , 2016.01.17

Wafer-scale, conformal and direct growth of MoS2 thin filmsby atomic layer deposition, APPLIED SURFACE SCIENCE , 제365권(집) , PP.160~165 , 2016.01.08

Self-Limiting Layer Synthesis of Transition Metal Dichalcogenides, Scientific Reports , 2016.01.04

Complementary Unipolar WS2 Field-Effect Transistors Using Fermi-Level Depinning Layers, Advanced Electronic Materials , 2015.12.15

Improved Corrosion Resistance and Mechanical Properties of CrN Hard Coatings with Atomic Layer Deposited Al2O3 Inter layer, ACS Applied Materials & Interfaces , 제7권(집) , 제48호 , PP.26716~26725 , 2015.11.23

Area-Selective Chemical Vapor Deposition of Co for Cu Capping Layer, CURRENT APPLIED PHYSICS , 2015.10.30

Formation of Continuous Pt Films on the Graphite Surface by Atomic Layer Deposition with Reactive O3, CHEMISTRY OF MATERIALS , 2015.10.01

Nucleation and Growth of an HfO2 Dielectric Layer for Graphene-Based Devices, CHEMISTRY OF MATERIALS , 제27권(집) , 제17호 , PP.5868~5877 , 2015.08.19

Reversible Liquid Adhesion Switching of Superamphiphobic Pd-decorated Ag dendrites via Gas-induced Structural Changes, CHEMISTRY OF MATERIALS , 제27권(집) , 제14호 , PP.4964~4971 , 2015.06.30

이산화 티타늄 위에서의 원자층 증착법 백금의 성장 특성, 한국표면공학회지 , 제48권(집) , 제2호 , PP.38~42 , 2015.04.30

Growth of Atomic Layer Deposition Platinum on TiO2, 한국표면공학회지 , 제48권(집) , 제2호 , PP.38~42 , 2015.04.30

In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides, Journal of Materials Chemistry C , 제3권(집) , PP.4852~4858 , 2015.04.22

Internal and External Atomic Steps in Graphite Exhibit Dramatically Different Physical and Chemical Properties, ACS Nano , 제9권(집) , PP.3814~3819 , 2015.03.27

Contact resistance reduction using Fermi level de-pinning layer for MoS2 FETs, International Electron Devices Meeting (IEDM) , 2015.03.02

One-step hydrothermal synthesis of graphene decorated V2O5 nanobelts for enhanced electrochemical energy storage, Scientific Reports , 제5권(집) , 2015.01.30

Real-time Detection of Chlorine Gas using Ni/Si Shell/Core Nanowires, Nanoscale Research Letters , 제10권(집) , 제1호 , PP.1~18 , 2015.01.28

Plasma-enhanced atomic layer deposition of Co on metal surfaces, SURFACE & COATINGS TECHNOLOGY , 제264권(집) , PP.60~65 , 2015.01.16

Hydrophobic Property of Rare Earth Oxides by Atomic Layer Deposition, CHEMISTRY OF MATERIALS , 2014.12.19

Selective metal deposition at graphene line defects by atomic layer deposition, NATURE COMMUNICATIONS , 제5권(집) , PP.4781~4789 , 2014.09.02

Effect of O3 on Growth of Pt by Atomic Layer Deposition, Journal of Physical Chemistry C , 제118권(집) , 제23호 , PP.12325~12332 , 2014.06.02

Vapor transport deposition and epitaxy of orthorhombic SnS on glass and NaCl substrates, APPLIED PHYSICS LETTERS , 제103권(집) , 제5호 , PP.1~5 , 2013.07.30

Self-Assembly Based Plasmonic Arrays Tuned by Atomic Layer Deposition for Extreme Visible Light Absorption, NANO LETTERS , 제13권(집) , 제7호 , PP.3352~3357 , 2013.07.01

Plasma-enhanced atomic layer deposition of Co using Co(MeCp)(2) precursor, JOURNAL OF ENERGY CHEMISTRY , 제22권(집) , 제3호 , PP.403~407 , 2013.05.01

Growth of Pt Nanowires by Atomic Layer Deposition on Highly Ordered Pyrolytic Graphite, NANO LETTERS , 제13권(집) , PP.457~463 , 2013.02.14

Flexible Wireless Temperature Sensors Based on Ni Microparticle-Filled Binary Polymer Composites, ADVANCED MATERIALS , 제25권(집) , 제6호 , PP.850~855 , 2013.02.13

Ru nanodot synthesis using CO2 supercritical fluid deposition, JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS , 제74권(집) , 제5호 , PP.664~667 , 2013.01.05

Supercritical Fluid Deposition of SiO2 Thin Films: Growth Characteristics and Film Properties, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제159권(집) , 제2호 , PP.46~49 , 2012.12.15

Nucleation-Controlled Growth of Nanoparticles by Atomic Layer Deposition, CHEMISTRY OF MATERIALS , 제24권(집) , 제21호 , PP.4051~4059 , 2012.10.19

The Low Temperature Atomic Layer Deposition of Ruthenium and the Effect ofOxygen Exposure, JOURNAL OF MATERIALS CHEMISTRY , 제22권(집) , PP.25154~25160 , 2012.10.01

Active MnOx Electrocatalysts Prepared by Atomic Layer Deposition for the OxygenEvolution and Oxygen Reduction Reactions, Advanced Energy Materials , 제2권(집) , 제10호 , PP.1269~1277 , 2012.06.14

Silicide Formation of Atomic Layer Deposition Co Using Ti and Ru Capping Layer, 한국재료학회지 , 제22권(집) , 제4호 , PP.202~206 , 2012.04.01

Initial Stage Growth during Plasma Enhanced Atomic Layer Deposition of Cobalt, CHEMICAL VAPOR DEPOSITION , 제18권(집) , PP.41~45 , 2012.03.05

Silicidation of Co/Si Core Shell Nanowires, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제159권(집) , 제5호 , PP.146~151 , 2012.03.02

Microstructure-Dependent Nucleation in Atomic Layer Deposition of Pt on TiO2, CHEMISTRY OF MATERIALS , 제24권(집) , 제2호 , PP.279~286 , 2012.01.24

Atomic Layer Deposition of CdS Quantum Dots for Solid-State Quantum Dot Sensitized Solar Cells, ADVANCED ENERGY MATERIALS , 제1권(집) , 제6호 , PP.1169~1175 , 2011.11.01

In-Situ Synchrotron X-Ray Scattering Study of Thin Film Growth by Atomic Layer Deposition, JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY , 제11권(집) , 제2호 , PP.1577~1580 , 2011.02.01

Effects of Self-Assembled Monolayers on Solid-State CdS Quantum Dot Sensitized Solar Cells, ACS NANO , 제5권(집) , 제2호 , PP.1495~1504 , 2011.02.01

Atomic Layer Deposition of Ni Thin Films and Application to Area-Selective Deposition, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제158권(집) , 제1호 , PP.1~5 , 2011.01.01

Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제158권(집) , 제11호 , PP.1179~1182 , 2011.01.01

Deposition of Ultrathin Polythiourea Films by Molecular Layer Deposition, CHEMISTRY OF MATERIALS , 제22권(집) , 제19호 , PP.5563~5569 , 2010.10.01

Self-formation of dielectric layer containing CoSi2 nanocrystals by plasma-enhanced atomic layer deposition, JOURNAL OF CRYSTAL GROWTH , 제312권(집) , 제15호 , PP.2215~2219 , 2010.07.01

Plasma-Enhanced Atomic Layer Deposition of Ni, JAPANESE JOURNAL OF APPLIED PHYSICS , 제49권(집) , 2010.05.01

Plasma-Enhanced Atomic Layer Deposition of Cobalt Using Cyclopentadienyl Isopropyl Acetamidinato-Cobalt as a Precursor, JAPANESE JOURNAL OF APPLIED PHYSICS , 제49권(집) , 2010.05.01

Degradation of the Deposition Blocking Layer During Area-Selective Plasma-Enhanced Atomic Layer Deposition of Cobalt, JOURNAL OF THE KOREAN PHYSICAL SOCIETY , 제56권(집) , PP.104~107 , 2010.01.01

Area Selective Atomic Layer Deposition by Microcontact Printing with a Water-Soluble Polymer, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제157권(집) , 제12호 , PP.600~604 , 2010.01.01

High Quality Area-Selective Atomic Layer Deposition Co Using Ammonia Gas as a Reactant, JOURNAL OF THE ELECTROCHEMICAL SOCIETY , 제157권(집) , PP.D10~D15 , 2010.01.01

Atomic Layer Deposition for Semiconductors, Ch.8 Back End of the Line, Springer US , 2013.10.29

Atomic Layer Deposition of Nanostructured Materials, Wiley-VCH , 2011.12.01